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    Spatially controlled sputtering of Mo1?xHfx thin films: Composition-tuned structure, electronic transport, and room-temperature CO2 sensing
    (Elsevier BV, 2026-09-30)
    Mo1−xHfx thin films with a compositional gradient were deposited by a co-sputtering process. Structural characterization by XRD, supported by Rietveld refinement, suggests that at low Hf concentrations the films exhibit an fcc-like structure, with a systematic increase in the lattice parameter as Hf content increases, consistent with Vegard's law. At higher Hf concentrations, the diffraction patterns evolve and are better described by a mixed-phase system involving hcp-Hf and bcc-Mo contributions, indicating the onset of phase coexistence. EDS confirms the compositional gradient and the effective incorporation of Hf into the Mo matrix, while scanning electron microscopy reveals position-dependent variations in morphology and thickness arising from different sputtering rates. XPS identifies the formation of native surface oxide layers and provides their chemical composition. Impedance spectroscopy measurements exhibit pronounced spatial variations in the electrical response, which are well described using equivalent electrical circuits and are consistent with the presence of these oxide layers. At Mo-rich regions, an inductive response is attributed to enhanced charge transport and current inertia effects in highly conductive areas. Finally, room-temperature gas-sensing measurements demonstrate an electrical response to CO2, revealing two distinct regimes: Hf-rich films exhibit an n-type-like response, whereas Mo-rich films show a p-type-like behavior.
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    Plasma parameters analysis in DC and RF magnetron sputtering using finite element method
    (Institute of Physics, 2025)
    Acomprehensive comparison of results obtained by finite element modelling (FEM) and plasma diagnostics between direct current (d.c.) and radio frequency (RF) magnetron sputtering at a frequency of 13.56 MHzis presented. This research studies the influence of power in the range 20W to 90Wat a constant argon gas pressure of 1 Pa. The maximum plasma density values are observed at 90Win the d.c. mode, reaching 1.41 × 1017m−3, and 1.95 × 1016m−3 in the RF mode, with results obtained within 1μs after ignition of the plasma. The results of the experiments showed that the plasma concentration at a distance of 23mmfrom the cathode has maximum values; indicating that the electron and ion density values increase as the d.c. and RF magnetron sputtering power increases. This research aims to demonstrate the different charge density values obtained in RF and d.c. plasma withFEMto facilitate the prediction of the magnetron sputtering discharge parameters of the MatER PUCP laboratory. Given that at this moment suitable models for RF sputtering are rather scarce, the obtained plasma parameters fromFEMwill be compared to plasma parameters that were obtained Experimentally.
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